METHOD FOR MANUFACTURING MODIFIED SUBSTRATE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

Abstract: the present invention provides a method for producing a modified substrate, the method making it possible to produce a modified substrate in which an ald coating film is formed in a predetermined region with good selectivity by performing an ald treatment, and a method for producing a semiconductor device, the method involving the method for producing a modified substrate. the method for producing a modified substrate of an embodiment of the present invention includes a step 1 of bringing a substrate having at least two surfaces of a first surface and a second surface, which are composed of materials different from each other, into contact with a chemical liquid including a compound which has a functional group bonded to or adsorbed on the first surface, and a crosslinkable group, and has a molecular weight of 500 or less, and a solvent, to form a first coating film on the first surface; and a step 2 of subjecting the substrate obtained in the step 1 to an atomic layer deposition treatment to form a second coating film on the second surface.

Inventor(s): Akihiro Hakamata, Naoya Shimoju, Koichi Sato, Atsushi Mizutani

CPC Classification: C23C16/04 (COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion ; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. , ; metallising of glass ; metallising mortars, concrete, artificial stone, ceramics or natural stone ; enamelling of, or applying a vitreous layer to, metals ; treating metal surfaces or coating of metals by electrolysis or electrophoresis ; single-crystal film growth ; by metallising textiles ; decorating textiles by locally metallising ))

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