METHOD FOR FORMING HARD AND ULTRA-SMOOTH A-C BY SPUTTERING

Abstract: a method for forming a coating on a substrate with the help of a coating device and a device for providing non-reactive ions. a negative bias is applied to the substrate for effecting an ion bombardment on the material deposited on the substrate thereby increasing the density of the material deposited.

Inventor(s): JULIEN KERAUDY, SEBASTIEN GUIMOND, SIEGFRIED KRASSNITZER

CPC Classification: C23C14/35 (COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion ; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. , ; metallising of glass ; metallising mortars, concrete, artificial stone, ceramics or natural stone ; enamelling of, or applying a vitreous layer to, metals ; treating metal surfaces or coating of metals by electrolysis or electrophoresis ; single-crystal film growth ; by metallising textiles ; decorating textiles by locally metallising ))

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