METHOD AND DEVICE FOR FORMING A FLUORIDE OR OXYLFLUORIDE LAYER FOR AN OPTICAL ELEMENT FOR THE VUV WAVELENGTH RANGE, AND OPTICAL ELEMENT COMPRISING SAID FLUORIDE OR OXYLFLUORIDE LAYER

Abstract: methods of forming a fluoride or oxyfluoride layer for an optical element for use in the vuv wavelength range, which methods comprise: depositing an oxide layer; and converting the oxide layer into the fluoride or oxyfluoride layer by irradiating the oxide layer with uv/vuv radiation in the presence of an active fluorination agent. an optical arrangement has at least one such optical element. an associated device for forming a fluoride or oxyfluoride layer for an optical element is designed for use in the vuv wavelength range.

Inventor(s): Felix Lange, Alexander Wiegand, Marcel Haerting, Katja Schick, Christian Sack

CPC Classification: C23C8/36 (using ionised gases, e.g. ionitriding)

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