COMPOSITION FOR CHEMICAL-MECHANICAL POLISHING AND METHOD FOR USING COMPOSITION

Abstract: the present disclosure relates to chemical mechanical polishing (cmp) compositions for polishing molybdenum surfaces.

Inventor(s): Shogo ONISHI

CPC Classification: C09K3/1463 (Anti-slip materials; Abrasives {(products specifically intended for the fabrication of abrasive tools, blocks or papers, or for operations of the kind of sand-blasting and barrelling , ; polishing compositions containing abrasive or grinding agents ; polishing of semi-conductors ; friction compositions for brakes or clutches )})

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