PROCESS FOR PRODUCING TRICHLOROSILANE WITH STRUCTURE-OPTIMISED SILICON PARTICLES

Abstract: a process for for producing or preparing chlorosilanes. the process includes providing chlorosilanes having the general formula hsiclwherein n is from 1 to 3. once provided, the chlorosilanes are placed into a fluidized bed reactor where a hydrogen and silicon tetrachloride-containing reaction gas is reacted with a particulate contact mass containing silicon at temperatures of 350� c. to 800� c. the operating granulation is understood as meaning the granulation or granulation mixture introduced into the fluidized bed reactor contains at least 1% by mass of silicon-containing particles s described by a structural parameter s. where the s has a value of at least 0 and is calculated as follows s=(�)��/�where �is a symmetry-weighted sphericity factor; the �is a poured density [g/cm], and the �is an average particle solids density [g/cm].

Inventor(s): Karl-Heinz Rimböck

CPC Classification: C01B33/1071 (NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; {METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS })

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