20250229379. High-precision Substrate Polis (KCTECH .,.)
HIGH-PRECISION SUBSTRATE POLISHING SYSTEM
Abstract: a retainer ring according to one embodiment comprises: a core part formed in a ring shape and including a metal material; and an injection part formed around the core part through molding so as to surround the core part, wherein the core part may include: a core main body formed in a ring shape; and at least one through hole formed through the core main body.
Inventor(s): In Chul SHIN, Hyun O KIM
CPC Classification: B24B37/32 (MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING (grinding of gear teeth , of screw-threads ; by electro-erosion ; abrasive or related blasting ; tools for grinding, buffing or sharpening ; polishing compositions ; abrasives ; electrolytic etching or polishing ; grinding arrangements for use on assembled railway tracks ); DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS)
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