20250221026. Semiconductor Structure Method Manufacturing Sa (TAIWAN SEMICONDUCTOR MANUFACTURING .)
SEMICONDUCTOR STRUCTURE AND METHOD OF MANUFACTURING THE SAME
Abstract: a semiconductor structure includes: a substrate; a fin protruding from the substrate, wherein the fin comprises a first semiconductor layer, a dielectric layer and a second semiconductor layer arranged over one another; and a gate electrode. the gate electrode includes: a first conductive portion extending from a sidewall of the first semiconductor layer to an upper surface of the substrate in a conformal manner; and a second conductive portion extending over the second semiconductor layer in a conformal manner.
Inventor(s): WEI-LUN CHEN
CPC Classification: H10D84/853 (No explanation available)
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