SYSTEM AND PROCESS FOR POST-CHEMICAL MECHANICAL POLISHING CLEANING

Abstract: a substrate cleaning system to remove particulates from multiple substrates includes a cleaning tank for applying a cleaning liquid to substrates, a rinse tank for applying a rinsing liquid to substrates, and a robot system. the cleaning tank includes a stationary lid, an input lid, and an output lid. the input and output lids allow a substrate carrier designed to carry an individual substrate to access an inner volume of the cleaning tank for processing. a transport system moves the substrate in the substrate carrier through the inner volume of the cleaning tank by creating a series of gaps between substrates to allow proper processing. the robot system transports substrates through the input and output lids of the cleaning tank, and transports substrates into the rinse tank.

Inventor(s): Clinton SAKATA, Brian K. KIRKPATRICK

CPC Classification: H01L21/67742 ({Mechanical parts of transfer devices (robots in general in )})

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