SUBSTRATE PROCESSING APPARATUS

Abstract: disclosed is a substrate processing apparatus including chamber having defined therein a processing space for a processing of a substrate, a substrate support unit disposed in the chamber, a gas supply unit configured to supply gas to the interior of the chamber, a plasma generation unit including a high-frequency power supply configured to generate plasma in the processing space, an electromagnet unit configured to generate a magnetic field in the processing space, and a controller. the electromagnet unit includes a coil module and a ferrofluid reservoir disposed adjacent to the coil module. the substrate processing apparatus suppresses heat generation in the coil module and precisely controls a magnetic field.

Inventor(s): In Ho KIM, Hyoung Kyu SON

CPC Classification: H01J37/32669 (Gas-filled discharge tubes (heating by discharge ))

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