20250218470. Three-dimensiona (SAMSUNG ELECTRONICS ., .)
THREE-DIMENSIONAL (3D) SEMICONDUCTOR MEMORY DEVICE AND ELECTRONIC SYSTEM INCLUDING THE SAME
Abstract: a 3d semiconductor memory device includes a peripheral circuit structure, an intermediate insulating layer and a cell array structure. the cell array structure includes a first substrate including a cell array region and a connection region; a stack structure comprising electrode layers and electrode interlayer insulating layers alternately stacked on the first substrate; a planarization insulating layer covering an end portion of the stack structure on the connection region; and a first through-via penetrating the planarization insulating layer, the first substrate and the intermediate insulating layer. the first through-via connects one of the electrode layers to the peripheral circuit structure. the first through-via includes a first and second via portion integrally connected to each other. the first via portion penetrates the planarization insulating layer and has a first width. the second via portion penetrates the intermediate insulating layer and has a second width greater than the first width.
Inventor(s): Haemin LEE
CPC Classification: G11C5/063 (STATIC STORES (semiconductor memory devices ))
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