MASS FLOW CONTROLLER, FLOW CONTROL METHOD USING THE SAME, AND SUBSTRATE PROCESSING METHOD INCLUDING THE SAME

Abstract: disclosed are mass flow controllers of a substrate processing apparatus, flow control methods the substrate processing apparatus, and substrate processing methods. the flow control method comprises receiving a mode selection signal, controlling a flow control valve under a first mode to allow a flow rate of fluid to change by a first flow rate, and controlling the flow control valve under a second mode to allow the flow rate of fluid to change by a second flow rate. the step of controlling the flow control valve under the first mode includes applying a first voltage to a first piezoelectric stack assembly of a piezoelectric actuator connected to the flow control valve. the step of controlling the flow control valve under the second mode includes applying a second voltage to a second piezoelectric stack assembly disposed on the first piezoelectric stack assembly. the second voltage is different from the first voltage.

Inventor(s): Seunghun Kim, Donghoon Park, Minjung Kim, Geongu Jang, Taemin Kim, Jiho Uh, Jinseok Lee

CPC Classification: G05D7/0635 (SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES)

Search for rejections for patent application number 20250216872