PASSIVE DUST TRAP, ILLUMINATION SYSTEM, AND LITHOGRAPHY SYSTEM

Abstract: a system includes first and second sections. the first section includes an elongated plate including a squared edge, a tapered edge, a first surface, a second surface, and first and second extensions extending from the second surface. the second section includes first and second chambers with a dividing wall between the first and second chambers, the first chamber including a planar surface and the second chamber including a sloped surface disposed opposite the tapered edge. the system includes first and second end plates to secure the first section above the second section such that the dividing wall is interposed between the first and second extensions.

Inventor(s): Sean Marcus Buczek, Edward Siqi Luo

CPC Classification: G03F7/70916 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices ; photosensitive materials or processes for photographic purposes ; electrophotography, sensitive layers or processes therefor ))

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