20250216801. Mirror Device, Projection (Carl Zeiss SMT)
MIRROR DEVICE, PROJECTION OBJECTIVE AND METHOD FOR MEASURING THE TEMPERATURE OF A MIRROR
Abstract: a mirror device, for example for a microlithographic projection exposure system, comprises a mirror, a sensor unit and a control unit. the mirror comprises a mirror body and a reflective surface provided on the mirror body. the sensor unit is designed to detect infrared radiation given off by the mirror body in order to derive a temperature measurement value therefrom and to send the temperature measurement value to the control unit. the mirror comprises a target with an increased emissivity for infrared radiation. the disclosure also relates to a method for measuring the temperature of a mirror.
Inventor(s): Andreas Raba, Matthias Manger, Hans Michael Stiepan, Joern Weber
CPC Classification: G03F7/70891 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices ; photosensitive materials or processes for photographic purposes ; electrophotography, sensitive layers or processes therefor ))
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