RETICLE STAGE

Abstract: provided is a reticle stage including a main base, an electrostatic chuck connected to the main base, a first surface of the electrostatic chuck being configured to support a reticle, a safety bar rotatably on the main base or electrostatic chuck, and a support member on the safety bar, an end of the support member overlapping with an edge of the reticle in a vertical direction, wherein the support member includes a plate portion on a first surface of the safety bar, and a support portion extending from the plate portion and configured to surface contact the reticle based on the reticle falling from the electrostatic chuck.

Inventor(s): Seonghyeon KIM, Dongjin LEE, Yozo MATSUDA, Sunmoon KIM, Jeonggil KIM

CPC Classification: G03F7/70716 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices ; photosensitive materials or processes for photographic purposes ; electrophotography, sensitive layers or processes therefor ))

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