MIRROR DEVICE, FOR EXAMPLE FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE SYSTEM, AND METHOD FOR MEASURING THE TEMPERATURE OF A MIRROR

Abstract: a mirror device, such as for a microlithographic projection exposure system, comprises a mirror, a sensor unit and a control unit. the mirror comprises a mirror body and a reflective surface provided on the mirror body. the sensor unit comprises a sensor element and a signal path extending to the control unit to transmit a measurement signal representing the temperature of the sensor element to the control unit. the sensor element is provided in the substrate of the mirror body. the sensor element comprises a plurality of electrical conductor paths integrated in the substrate of the mirror body. the conductor paths form a plurality of crossing points electrically conductively connecting the conductor paths to one another.

Inventor(s): Johannes LIPPERT, Stefan HEMBACHER, Matthias MANGER, Markus RAAB, Andreas RABA, Joern WEBER, Mirko BUECHSENSCHUETZ

CPC Classification: G03F7/70225 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices ; photosensitive materials or processes for photographic purposes ; electrophotography, sensitive layers or processes therefor ))

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