SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION

Abstract: disclosed are a semiconductor photoresist composition and a method of forming patterns using the same, the semiconductor photoresist composition including an sn-containing organometallic compound, a carboxylic acid compound represented by chemical formula 1, and a solvent.

Inventor(s): Sumin JANG, Bukeun OH, Eunmi KANG, Chungheon LEE, Seung-Wook SHIN, Wanhee LIM

CPC Classification: G03F7/0043 ({Chalcogenides; Silicon, germanium, arsenic or derivatives thereof; Metals, oxides or alloys thereof ( takes precedence)})

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