SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION

Abstract: disclosed are a semiconductor photoresist composition and a method of forming patterns using the same, the semiconductor photoresist composition including a sn-containing organometallic compound; a sn-containing organometallic compound, a compound represented by chemical formula 1, and a solvent. the descriptions of chemical formula 1 are as described in the specification.

Inventor(s): Seung-Wook SHIN, Sumin JANG, Eunmi KANG, Jimin KIM, Yaeun SEO, Taegeun SEONG, Changsoo WOO, Minyoung LEE, Wanhee LIM, Seungwoo JANG, Joonhee HAN

CPC Classification: G03F7/0042 ({with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists ( takes precedence)})

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