System and Method for Inspecting Mask

Abstract: a method for inspecting a mask is provided. the method includes placing the mask on a stage of an inspection tool; using a fan assembly, introducing a gas flow into the inspection tool; performing an environmental pressure control over the inspection tool; and capturing an image of the mask. the environmental pressure control includes monitoring an in-tool pressure inside the inspection tool and an out-tool pressure outside the inspection tool; determining whether the pressure difference between the in-tool pressure and the out-tool pressure is out of an acceptable range; and in response the determination determines that the pressure difference between the in-tool pressure and the out-tool pressure is out of the acceptable range, adjusting the power of the fan assembly.

Inventor(s): Yen-Hsun CHEN, Chao-Ting CHEN, Chih-Feng LU, Han-Lung CHANG, Li-Jui CHEN

CPC Classification: G03F1/84 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices ; photosensitive materials or processes for photographic purposes ; electrophotography, sensitive layers or processes therefor ))

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