PELLICLE FOR EXTREME ULTRAVIOLET LITHOGRAPHY BASED ON METAL CARBIDE NANOTUBES AND METHOD FOR MANUFACTURING THE SAME

Abstract: proposed is a pellicle for extreme ultraviolet (euv) lithography based on metal carbide nanotubes having excellent optical properties, such as euv transmittance, as well as chemical durability required in the euv lithography environment. the pellicle may include a frame having an opening formed in a central portion thereof, and a porous pellicle layer supported by the frame, covering the opening, and formed with a mesh structure based on metal carbide nanotubes. a method for manufacturing the pellicle is also proposed.

Inventor(s): Hyeong Keun KIM, Seul Gi KIM

CPC Classification: G03F1/62 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices ; photosensitive materials or processes for photographic purposes ; electrophotography, sensitive layers or processes therefor ))

Search for rejections for patent application number 20250216771