REUSE OF RESOLUTION ENHANCEMENT TECHNIQUE (RET) DATA IN RET PROCESSING OF NEW MASK LAYOUTS

Abstract: determining initial conditions for resolution enhancement technology (ret) processing of a new mask layer comprises reusing ret geometries from layout portions of previously ret-processed mask layers that match layout portions in the new mask layer. if the ret geometries comprise sub-resolution assist features (srafs), conflicts between srafs corresponding to neighboring matching layout portions can be resolved as part of determining the initial conditions. the initial conditions can also be based on ret geometries generated by machine learning models for layout portions of the new layer that closely match layout portions in previously processed mask layers. initial conditions for the remaining layout portions in the new mask layer are generated via ret processing. these initial conditions can enable faster ret processing runtime or reduced computing load for a given level of ret processing output quality.

Inventor(s): Kshitij Auluck, Reza Rashetnia, Prasad N. Atkar

CPC Classification: G03F1/36 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices ; photosensitive materials or processes for photographic purposes ; electrophotography, sensitive layers or processes therefor ))

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