WAFER INSPECTION SYSTEM

Abstract: a wafer inspection system includes an optical device, a movable stage, a position measurement device, and a control device. the optical device is configured to generate a light toward a wafer and capture a reflected light. the movable stage is configured to move the wafer. the position measurement device is configured to obtain a position offset between an actual path and a predetermined path. the position offset includes a first error and a second error. a stage coordinate system has a first and a second stage axis perpendicular to each other, and the first and the second errors are parallel to the first and the second stage axis, respectively. the control device is configured to control a timing for emitting the light or control a timing to capture the reflected light according to the position offset in real time in order to mitigate undesired effects caused by the position offset.

Inventor(s): ZHONG-HUA DONG, CHENGWEI HSU

CPC Classification: G01N21/9501 ({Semiconductor wafers (manufacturing processes per se of semiconductor devices implementing a measuring step )})

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