SHOWER HEAD UNIT, GAS SUPPLY UNIT AND SUBSTRATE PROCESSING DEVICE HAVING THE SAME

Abstract: a shower head unit configured to uniformly discharge gas for minority wafer surfaces in a photo process, a gas supply unit having the shower head unit and a substrate processing device having the gas supply unit are disclosed. a shower head unit includes a guide member, an inlet member and an injection member. the guide member is disposed to cover a substrate disposed within a process chamber. the inlet member is disposed above the guide member to have a first buffer space therein. the injection member is disposed under the guide member to inject gas supplied from an outside through the first buffer space of the inflow member and the guide member toward the substrate. therefore, a buffer space is formed in a central portion of the shower head unit so as not to generate eccentricity when gas is injected through the shower head unit, so that uniform injection may be performed through the injection member.

Inventor(s): Jaeoh BANG, Seunghwan LEE, Gilsoo EUN, Sunwoon KIM

CPC Classification: C23C16/45565 (COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion ; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. , ; metallising of glass ; metallising mortars, concrete, artificial stone, ceramics or natural stone ; enamelling of, or applying a vitreous layer to, metals ; treating metal surfaces or coating of metals by electrolysis or electrophoresis ; single-crystal film growth ; by metallising textiles ; decorating textiles by locally metallising ))

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