20250215320. Etching Method Plas (Tokyo Electron Limited)

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

Abstract: a technique of improving an etching shape is provided.

Inventor(s): Ryo MATSUBARA, Yusuke TAKINO, Maju TOMURA

CPC Classification: C09K13/08 (MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE)

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