METHOD AND INSTALLATION FOR PLASMA COATING

Abstract: the invention relates to a method and to an installation for coating substrates by means of plasma-enhanced chemical vapor deposition (pecvd), in particular for an optionally simultaneous coating of a plurality of substrate surfaces by means of pecvd. a specific arrangement and/or movement of the substrates in a reaction chamber as well as specific operating parameters for the method and/or the installation are also proposed.

Inventor(s): Valbon DAUT, Mohammed RAZOUKI, Steffen HEUSER

CPC Classification: C23C16/54 (COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion ; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. , ; metallising of glass ; metallising mortars, concrete, artificial stone, ceramics or natural stone ; enamelling of, or applying a vitreous layer to, metals ; treating metal surfaces or coating of metals by electrolysis or electrophoresis ; single-crystal film growth ; by metallising textiles ; decorating textiles by locally metallising ))

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