VACUUM-BASED THIN FILM MODIFIER, THIN FILM MODIFICATION COMPOSITION INCLUDING VACUUM-BASED THIN FILM MODIFIER, METHOD OF FORMING THIN FILM USING THIN FILM MODIFICATION COMPOSITION, SEMICONDUCTOR SUBSTRATE INCLUDING THIN FILM, AND SEMICONDUCTOR DEVICE INCLUDING SEMICONDUCTOR SUBSTRATE

Abstract: the present invention relates to a vacuum-based thin film modifier, a thin film modification composition including the vacuum-based thin film modifier, a method of forming a thin film using the thin film modification composition, a semiconductor substrate including the thin film, and a semiconductor device including the semiconductor substrate. according to the present invention, by providing a compound having a predetermined structure as a vacuum-based thin film modifier, the growth rate of a deposition film may be appropriately reduced in a vacuum-based thin film process. thus, even when forming a thin film on a substrate with a complex structure, step coverage and the thickness uniformity of a thin film may be greatly improved, the efficiency of etching a film may be improved, and contamination by impurities such as carbon may be significantly reduced.

Inventor(s): Chang Bong YEON, Jae Sun JUNG, Deok Hyun CHO, So Eun HA, Ji Hyun NAM

CPC Classification: C23C16/45534 (COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion ; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. , ; metallising of glass ; metallising mortars, concrete, artificial stone, ceramics or natural stone ; enamelling of, or applying a vitreous layer to, metals ; treating metal surfaces or coating of metals by electrolysis or electrophoresis ; single-crystal film growth ; by metallising textiles ; decorating textiles by locally metallising ))

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