APPARATUS FOR STRESS-REDUCED MOUNTING OF MEMS-BASED MICROMIRRORS

Abstract: an apparatus for stress-reduced mounting of mems-based micromirrors on a metallic support structure comprises a plate extending in a main plane of extent and a plurality of compensation elements which are connected to the plate and have connecting elements which extend across the main plane of extent and a plurality of base elements. a respective group with a plurality of connecting elements is connected to a common base element. the apparatus is produced using mems technology.

Inventor(s): Markus HAUF, Stefan WALZ, Yanko Sarov, Fabian Haacker

CPC Classification: B81B7/0029 (Microstructural systems; {Auxiliary parts of microstructural devices or systems})

Search for rejections for patent application number 20250206598