SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

Abstract: a substrate processing apparatus of processing a substrate includes a substrate holder having a holding surface on which the substrate is held; a rotator configured to rotate the substrate on the holding surface around a rotation axis of the substrate holder; and a laser radiator configured to radiate laser light to the substrate on the holding surface. the holding surface of the substrate holder has a diameter smaller than that of the substrate.

Inventor(s): Yohei YAMASHITA, Yohei YAMAWAKI

CPC Classification: B23K26/706 ({Protective screens})

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