CLEANING SYSTEM AND METHOD FOR A CURVED SUBSTRATE

Abstract: a curved target substrate cleaning system includes a pressure-type cleaning unit for cleaning a cleaning area of a target substrate having a curved surface by applying pressure to the cleaning area, a support body detachably supporting the pressure cleaning unit at a predetermined height with respect to a cleaning area of the target substrate having the curved portion, a cleaning area flat maintaining unit that clamps one end of a target substrate having a curved portion and adjusts a height of the curved portion to maintain the cleaning area of the target substrate in a predetermined orientation with respect to the pressure-type cleaning unit, and a moving unit that moves the cleaning area flat maintenance unit back and forth in one direction with respect to the pressure-type cleaning unit.

Inventor(s): JINWOOK YANG, Se Hun PARK, JONGWON PARK

CPC Classification: B08B11/04 (CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL (brushes ; devices for domestic or like cleaning ; {cleaning golf-clubs or golf accessories ; cleaning grips of bats on rackets } ; separation of particles from liquids or gases ; separation of solids , ; spraying or applying liquids or other fluent materials to surfaces in general ; cleaning devices for conveyors ; concurrent cleaning, filling and closing of bottles ; inhibiting corrosion or incrustation in general ; cleaning streets, permanent ways, beaches or land ; parts, details or accessories of swimming or splash baths or pools, specially adapted for cleaning ; preventing or removing electrostatic charges ))

Search for rejections for patent application number 20250196205