APPARATUS FOR CLEANING BRUSHES

Abstract: an apparatus for cleaning brushes may include a scrubbing jig and at least two scrubbing surfaces. the scrubbing jig may be configured to scrub at least two brushes used in cleaning a wafer. the at least two scrubbing surfaces may be provided to the scrubbing jig to make contact with the at least two brushes. accordingly, a contamination of a wafer by contaminants in the brushes may be suppressed in a following cleaning process.

Inventor(s): Jubong Lee, Hyuntae Lee, Ahra Jeon, Sungyong Park, Jaemin Jung, Hoseop Choi

CPC Classification: A46B17/06 (BRUSHES (handles not integral with brushware ))

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