GAS PURGE SYSTEMS FOR A LASER SOURCE

Abstract: a laser source includes a laser chamber configured to generate a first laser beam. the laser source further includes an optical system coupled to the laser chamber and configured to receive the first laser beam and output an output laser beam. the laser source also includes a gas purge system. according to some aspects, the gas purge system is configured to supply a nitrogen gas into the optical system at a pressure less than atmospheric pressure. according to some aspects, the gas purge system is configured to supply a helium gas into the optical system.

Inventor(s): Gamaralalage G Padmabandu

CPC Classification: G03F7/70933 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices ; photosensitive materials or processes for photographic purposes ; electrophotography, sensitive layers or processes therefor ))

Search for rejections for patent application number 20250189905