INTERMEDIATE PRODUCT FOR PRODUCING AN OPTICAL ELEMENT FOR A PROJECTION EXPOSURE APPARATUS, OPTICAL ELEMENT FOR A PROJECTION EXPOSURE APPARATUS, METHOD FOR PRODUCING AN INTERMEDIATE PRODUCT, AND METHOD FOR PRODUCING AN OPTICAL ELEMENT

Abstract: an intermediate product for producing an optical element for a projection exposure apparatus () has a substrate () for specifying a basic topography of an optical surface, wherein a plurality of etchable layers including a layer () to be structured and a contrast layer () are applied to the substrate (), wherein the layer () to be structured and the contrast layer () have different chemical properties such that a removal of the contrast layer () can be detected in situ.

Inventor(s): Sandro HOFFMANN, Christoph SCHMITZ

CPC Classification: G03F7/70316 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices ; photosensitive materials or processes for photographic purposes ; electrophotography, sensitive layers or processes therefor ))

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