UV-stabilized Photo Nanoimprint Lithography Resin

Abstract: a uv-stabilized photo nanoimprint lithography (p-nil) resin is disclosed. the p-nil resin comprises: an organic binder selected from the group consisting of: acrylate monomeric components, acrylate oligomeric polymerizable components, and acrylated polymers; titanium oxide (tio) inorganic nanoparticles dispersed in the p-nil resin, the titanium oxide inorganic nanoparticles having one or more metal oxides coated on or added into the titanium oxide particles, the metal oxides are selected from the group consisting of: sio, alo, zro, sno, and nio; and a light-activated initiator for polymerization of acrylates. the p-nil resin may optionally include a radical scavenger selected from the group consisting of the hals type, ascorbate type, and hydroquinone type; and optionally includes an adhesion promoter for acrylates.

Inventor(s): Chau Ha, Martin Newcomb

CPC Classification: G03F7/038 (Macromolecular compounds which are rendered insoluble or differentially wettable ( takes precedence; macromolecular azides ; macromolecular diazonium compounds ))

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