LITHOGRAPHIC PATTERN REPRESENTATION WITH CURVILINEAR ELEMENTS

Abstract: methods, systems, and computer software are disclosed for determining a mask pattern for use with a lithographic process. one method includes assigning locations of two-dimensional elements based on a target pattern, associating the two-dimensional elements based on association criteria to form a cluster that represents a mask feature, and adjusting the two-dimensional elements of the cluster to vary the mask feature.

Inventor(s): Ya LUO, Yen-Wen LU, Been-Der CHEN, Rafael C. HOWELL, Quan ZHANG, Zhangnan ZHU, Xiaoshuang CHEN

CPC Classification: G03F1/36 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices ; photosensitive materials or processes for photographic purposes ; electrophotography, sensitive layers or processes therefor ))

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