METHODS AND APPARATUS FOR VAPOR PRESSURE MONITORING

Abstract: various embodiments of the present technology may provide methods and apparatus for vapor pressure monitoring in a semiconductor manufacturing tool. the apparatus may include a vessel containing a chemistry and a outlet connected to a gas line, wherein the gas line includes a first section that is connected to a reactor and second section that is connected an exhaust port. the gas line may also include a third section connected to a pressure sensor.

Inventor(s): Nirmal Gokuldas Waykole, Qi Qi, Shreyans Kedia

CPC Classification: G01L19/0038 (Details of, or accessories for, apparatus for measuring steady or quasi-steady pressure of a fluent medium insofar as such details or accessories are not special to particular types of pressure gauges)

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