COMPOUND, METHOD FOR PRODUCING THE COMPOUND, LEVELING AGENT, COATING COMPOSITION, RESIST COMPOSITION, AND ARTICLE

Abstract: provided is a compound capable of functioning as a leveling agent which imparts high smoothness and the effect of suppressing pin unevenness to a coating film. specifically, a compound includes a polymer block of a polymerizable monomer at each of both ends of a silicone chain, dispersity (mw/mn) which is the ratio of the weight-average molecular weight to the number-average molecular weight being within a range of 1.0 to 2.0.

Inventor(s): Ryuta Fujiwara, Junpei Ueno

CPC Classification: C08G77/44 (containing only polysiloxane sequences)

Search for rejections for patent application number 20250188226