SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD USING THE SAME

Abstract: disclosed are substrate processing apparatuses and methods. the substrate processing apparatus comprises a first process chamber including a first process space, a stage in the first process space and being configured to support a substrate, a stage driving mechanism configured to drive the stage to rotate about a first axis, a cleaning nozzle arm configured to supply a cleaning solution onto the stage, a gas supply unit configured to provide an inert gas to the first process space, and an airflow generator between the stage and the gas supply unit and being configured to generate a spiral-shaped rotating air current.

Inventor(s): AHRA JEON, SUNG YONG PARK, JAEMIN JUNG, HOSEOP CHOI

CPC Classification: B08B5/00 (Cleaning by methods involving the use of air flow or gas flow ( takes precedence))

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