INTERFEROMETRY-BASED TEMPERATURE MONITORING IN MANUFACTURING SYSTEMS

Abstract: disclosed systems and techniques are directed to interferometry-based temperature monitoring of various operations performed in manufacturing systems. for example, the disclosed techniques include directing an incident light to a sample and detecting a plurality of interference patterns (ips) associated with a light departing from the sample. the light departing from the sample can be generated upon interaction of the incident light with the sample. each ip of the plurality of ips can be associated with a respective temperature of a plurality of temperatures of the sample. the techniques further include determining, using the plurality of ips, a temperature difference between a first temperature of the plurality of temperatures and a second temperature of the plurality of temperatures.

Inventor(s): Eric Chin Hong Ng, Mehdi Vaez-Iravani

CPC Classification: H01L21/67248 (Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components {; Apparatus not specifically provided for elsewhere (processes per se , , ; simple temporary support means, e.g. using adhesives, electric or magnetic means , ; apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies and for methods related thereto ;)})

Search for rejections for patent application number 20250183071