METHOD OF CHARACTERIZING A FAULT IN A SCANNING ELECTRON MICROSCOPE

Abstract: a method of characterizing a fault in a scanning electron microscope, wherein the scanning electron microscope is suitable for analysing and/or processing a sample, especially a lithography mask, with the aid of an electron beam, wherein the method has the following steps:

Inventor(s): David Laemmle, Katharina Gries, Marion Batz, Daniel Schwarz, Gunther Scheunert, Daniel Alexander Emmrich, Julian Braun

CPC Classification: H01J37/244 (ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps ; arc lamps with consumable electrodes ; particle accelerators ))

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