STRUCTURE AND METHOD OF RETICLE POD HAVING INSPECTION WINDOW

Abstract: a method includes: performing a first inspection on a reticle in a reticle pod, the reticle pod including a sealed space to accommodate the reticle, and the reticle pod further comprising an inspection window, wherein the first inspection is performed through the inspection window with the sealed space keeping sealed; and moving the reticle out of the reticle pod for performing a first operation of a semiconductor device using the reticle in response to determining no defect found on the reticle.

Inventor(s): WANG CHENG SHIH, HAO-MING CHANG, CHUNG-YANG HUANG, CHENG-MING LIN

CPC Classification: G03F1/84 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices ; photosensitive materials or processes for photographic purposes ; electrophotography, sensitive layers or processes therefor ))

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