GLASS SUBSTRATES COMPRISING SILICA-BASED GLASS WITH INCREASED HYDROXYL GROUP UNIFORMITY, AND METHODS OF FORMING THE SAME

Abstract: a glass substrate including a silica-based glass, the silica-based glass includes silica and from 0 wt. % to 15 wt. % titania. a first portion of the silica-based glass has a height of 1.0 mm and a first cross-section having an area greater than or equal to 50.0 cm. a first sub-portion of the first portion has a height of 1.0 mm, a length of 40.0 mm, a width of 40.0 mm, and a second cross-section. a peak-to-valley difference of a hydroxyl group concentration of the first sub-portion is less than or equal to 15 ppm, as measured at the second cross-section. a method of forming a glass substrate includes heating a molded precursor mass. the molded precursor mass includes soot particles. the heating includes exposing the molded precursor mass to a consolidation environment containing steam, and maintaining the molded precursor mass in the consolidation environment while reducing the consolidation temperature.

Inventor(s): Michael John Campion, Sergey Nikolaevich Shubin, Chunfeng Zhou

CPC Classification: C03B20/00 (Processes specially adapted for the production of quartz or fused silica articles {, not otherwise provided for (, , , , , take precedence)})

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