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20250178119. Sys (Lawrence Livermore National Security, LLC)

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SYSTEMS AND METHODS FOR GENERATING GLASS-ENGRAVED NANOSCALE GRATING PERIODS FOR BIREFRINGEMENT METASURFACES

Abstract: the present disclosure relates to a system for creating parallel, near-linear features with a desired period on a surface of a workpiece, where the workpiece includes a planar substrate and a material layer formed on the planar substrate. in one embodiment the system has an etching beam generator configured to generate a processing beam, and a support structure for holding a workpiece. the workpiece is held such that an upper surface of the material layer of the workpiece is supported at an angle which is non-normal to a direction of travel of the processing beam. the angle correlates to a desired period of features to be fabricated on the upper surface of the material layer. the processing beam transforms the material layer to create generally parallel, generally linear features having the desired a period. subsequent normal incidence etching may be used to transfer this material layer grating mask structure to the underlying substrate.

Inventor(s): Nathan James RAY, Hoang T. Nguyen, Eyal Feigenbaum, Jae Hyuck Yoo

CPC Classification: B23K15/08 (SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM (making metal-coated products by extruding metal ; building up linings or coverings by casting ; casting by dipping ; manufacture of composite layers by sintering metal powder ; arrangements on machine tools for copying or controlling ; covering metals or covering materials with metals, not otherwise provided for ; burners ))

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