SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING DEVICE

Abstract: a substrate processing method includes a processing process, an imaging process, a synchronizing process, and a calculation process. in the processing process, a controller outputs a control signal to at least one driver of a processing unit while measuring a time and makes the processing unit perform processing on a substrate. in the imaging process, a camera takes an image in the chamber to generate image data. in the synchronizing process, the controller performs synchronizing processing of reducing a difference between a current time measured by the controller and a current time measured by the camera. in the calculation process, an occurrence time of an event change in the chamber is calculated based on an imaging time of the image data, and a time difference between an output time of the control signal and the occurrence time is obtained based on a synchronized time.

Inventor(s): Atsuro EITOKU

CPC Classification: B05C11/1002 (APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL (spraying apparatus, atomising apparatus, nozzles ; plant for applying liquids or other fluent materials to objects by electrostatic spraying ))

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