20250177712. Fab (Lawrence Livermore National Security, LLC)
FABRICATION OF CARBON-CONTAINING NANONEEDLES
Abstract: a method includes masking a carbon-containing single crystal for defining masked regions and unmasked regions on the single crystal. the method also includes performing a plasma etch for removing portions of the unmasked regions of the single crystal, thereby defining a pillar in each unmasked region, and performing a chemical etch on the pillars at a temperature between 1200� c. and 1600� c. for selectively reducing a width of each pillar.
Inventor(s): Clint D. Frye, Mihail Bora, Adam M. Conway, Devin Joseph Funaro, Paulius Vytautas Grivickas, David L. Hall, Lars F. Voss
CPC Classification: A61M37/0015 ({by using microneedles})
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Categories:
- Patent Applications
- Lawrence Livermore National Security, LLC
- CPC A61M37/0015
- Clint D. Frye of Livermore CA US
- Mihail Bora of Livermore CA US
- Adam M. Conway of Livermore CA US
- Devin Joseph Funaro of Livermore CA US
- Paulius Vytautas Grivickas of Livermore CA US
- David L. Hall of San Ramon CA US
- Lars F. Voss of Livermore CA US