COACERVATE CLEANSING COMPOSITION

Abstract: the disclosure relates to compositions comprising (a) at least one amphoteric surfactant, (b) at least one glycolipid, (c) at least one cationic polymer from about 0.05% to about 2%; and (d) at least one cosmetically acceptable solvent wherein the cleansing system is essentially free of phenoxyethanol, and wherein the ph of the composition is between 4 and 8, and wherein the ratio of a to b is from about 0.4 to about 4, and wherein the total concentration of a and b combined is about 10 to about 20% of the total weight of the composition. the compositions can be used as rinse-off compositions for cleansing skin.

Inventor(s): Changlong CHEN, Siliu Tan, Mariko Hasebe

CPC Classification: A61K8/466 ({containing sulfonic acid derivatives; Salts})

Search for rejections for patent application number 20250177273