IMPLANT AND SUTURING DEVICES

Abstract: the embodiments of the present disclosure provide an implant and a suturing device. a first chamfer is provided between a front end surface of the implant and a circumferential sidewall of the implant. a second chamfer is provided between a rear end surface of the implant and the circumferential sidewall of the implant. the suturing device comprises a puncture needle and one or more implants. the one or more implants are located on the puncture needle. the puncture needle is provided with a channel extending in an axial direction. the one or more implants can be triggered from the suturing device through the channel. at least two limiting structures are provided on an inner wall of the channel. the at least two limiting structures are arranged along a circumferential direction; and the at least two limiting structures can at least block a second implant to be triggered, such that an applied force is increased when the second implant to be triggered is triggered out of the suturing device.

Inventor(s): Jiancheng HU, Bin LI, Shengjun XU

CPC Classification: A61B17/3468 ({for implanting or removing devices, e.g. prostheses, implants, seeds, wires (devices for implanting seeds )})

Search for rejections for patent application number 20250177000