SEMICONDUCTOR STRUCTURE INCLUDING A BIT LINE STRUCTURE AND METHOD OF MANUFACTURING THE SAME

Abstract: a semiconductor structure and a method of manufacturing the same are provided. the semiconductor structure includes a base structure, a bit line structure and a spacer. the bit line structure is disposed over the base structure. the spacer is disposed around the bit line structure, and includes a first layer, a second layer and a third layer. the third layer is disposed over the second layer. a width of the third layer is substantially equal to a width of the second layer.

Inventor(s): HSU CHIANG

CPC Classification: H10D64/251 (No explanation available)

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