SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD

Abstract: a controller of a substrate processing system controls a lifter to perform first batch processing to immerse a plurality of substrates in a vertical attitude in a chemical liquid in a chemical treatment tank. the controller controls a second attitude changing mechanism to rotate the plurality of substrates subjected to the first batch processing about a horizontal axis, to vertically invert the plurality of substrates in the vertical attitude. the controller controls the lifter to perform second batch processing to immerse the plurality of vertically-inverted substrates in the vertical attitude in the chemical liquid in the chemical treatment tank.

Inventor(s): Shinichi TANIGUCHI, Akihiro IWASAKI

CPC Classification: H01L21/67781 (Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components {; Apparatus not specifically provided for elsewhere (processes per se , , ; simple temporary support means, e.g. using adhesives, electric or magnetic means , ; apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies and for methods related thereto ;)})

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