SUPPORT SLEEVE FOR SUPPORTING A PROCESS VESSEL AND ASSOCIATED SEMICONDUCTOR PROCESSING FURNACES

Abstract: support sleeves and semiconductor processing furnaces including such support sleeves are disclosed. the support sleeves disclosed include a single support surface for supporting a process vessel within a semiconductor processing furnace. the support sleeves disclosed also include a number of internal gas channels configured for forming a gas seal between the support sleeve and a process vessel supported on the support sleeve.

Inventor(s): Theodorus G.M. Oosterlaken, Marco Dirkmaat, Klaas Boonstra, Herbert Terhorst

CPC Classification: H01L21/67383 (using specially adapted carriers {or holders; Fixing the workpieces on such carriers or holders (holders for supporting a complete device in operation )})

Search for rejections for patent application number 20250174475