INFORMATION PROCESSING APPARATUS, INFERENCE APPARATUS, MACHINE-LEARNING APPARATUS, INFORMATION PROCESSING METHOD, INFERENCE METHOD, AND MACHINE-LEARNING METHOD

Abstract: an information processing apparatus includes: an information acquisition section () configured to acquire finishing conditions including substrate-holder state information indicating a state of a substrate holder and a finishing-fluid-supply-structure state information indicating a state of a finishing-fluid supply structure in a finishing process of a substrate performed by a substrate processing apparatus including the substrate holder configured to hold the substrate and the finishing-fluid supply structure configured to supply a substrate finishing fluid onto the substrate; and a state prediction section () configured to predict substrate state information for the substrate on which the finishing process is performed under the finishing conditions by inputting the finishing conditions acquired by the information acquisition section () to a learning model (a, b) that has been generated by machine learning that causes the learning model to learn a correlation between the finishing conditions and substrate state information indicating a state of the substrate on which the finishing process is performed under the finishing conditions.

Inventor(s): Kenichi TAKEBUCHI, Kenichiro SAITO

CPC Classification: G06N20/00 (Machine learning)

Search for rejections for patent application number 20250173611