STATUS MONITORING AND REPORTING FOR ULTRAVIOLET LIGHT SOURCES

Abstract: a computing device including a display screen is at a photolithography exposure facility. the facility includes one or more photolithography exposure apparatuses. the computing device is configured to display on the display screen: a status region including one or more status indicators, each status indicator associated with an ultraviolet (uv) light source configured to supply light to a respective photolithography exposure apparatus of the one or more photolithography apparatuses; a graph region including one or more graphs, each graph displaying information relating to the one or more status indicators; and a filtering region including one or more menu items selectable to control the information displayed in the status region and/or in the one or more graphs.

Inventor(s): Spencer Ryan Williams, Christopher James Stevens, Kent Steiner, Ye Jiang, Jung Yoon Shin

CPC Classification: G03F7/70991 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices ; photosensitive materials or processes for photographic purposes ; electrophotography, sensitive layers or processes therefor ))

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